The Larry Aldrich Award
The biennial Larry Aldrich Award honors an American artist whose work has had a significant impact on contemporary visual culture during recent years. An independent jury of artists, collectors, critics, curators, and gallerists selects the recipient. The Museum is grateful to Larry Aldrich for his generosity and foresight in establishing and funding the Award. Applications are not accepted for this accolade.
The honoree receives $50,000 and the opportunity for an exhibition, accompanied by a catalogue, at The Aldrich Contemporary Art Museum.
Previous recipients of the Award include:
Elizabeth Peyton,* 2006; Kara Walker, 2005; Catherine Opie,* 2004; David Hammons, 2003; Fred Wilson,* 2002; Mark Dion,* 2001; Doug Aitken, 2000; Janine Antoni,* 1999; Ann Hamilton,* 1998; Charles Ray, 1997; Robert Gober,* 1996; Bruce Nauman,* 1995; Cindy Sherman, 1994; and Elizabeth Murray, 1993.
*Exhibition at The Aldrich with catalogue
The Larry Aldrich Award was presented on an annual basis between the years 1995 and 2006. During this period the honoree was awarded $25,000 and the opportunity for an exhibition at The Aldrich Contemporary Art Museum.
The Aldrich Emerging Artist Award
The Aldrich Emerging Artist Award is administered and the recipient selected by the curatorial staff of The Aldrich, which includes curator Merrill Falkenberg, exhibitions director Richard Klein, and director Harry Philbrick. Beneficiaries of the award, which has been presented by the Museum since 1997, receive a cash prize of $5,000 and the opportunity to exhibit at The Aldrich. Applications are not accepted for this award.
Previous recipients have included Marti Cormand, 2007; Josh Azzarella, 2006; Todd Hebert, 2005; David Opdyke, 2004; Elizabeth Demaray, 2003; Yuken Teruya, 2002; Claire Corey, 2001; John F. Simon, Jr., 2000; Bonnie Collura, 1999; Paul Henry Ramirez, 1998; and Roxy Paine, 1997.
Radius is a professional development program organized by The Aldrich Contemporary Art Museum in conjunction with the Ridgefield Guild of Artists to promote the growth and interests of regional artists.
Artists who participate in the Radius exhibition are chosen from a review of submissions received following an open call for entries. In addition to the group exhibition at the Ridgefield Guild of Artists, selected artists receive an individual exchange with a curator, through a review of their portfolio and original work, focusing on professional development. Radius also includes networking opportunities, workshops, and a public forum to address important issues for professional advancement.
Our eleventh annual Radius exhibition will be held from February 27 to March 27, 2010. Applications will become available online on September 1, 2009. Applications for Radius are only accepted online and must be submitted by 3 pm on October 16, 2009. All submissions will be reviewed by the Radius Selection Committee, comprised of curators from the Aldrich and the Guild. The online submissions review will take place in October. Notification letters will be emailed by October 30, 2009. The portfolio reviews will take place from November 2 to 6, 2009. The opening reception for the exhibition will be held at the Guild of Artists on February 27, 2010, preceded by a Radius Forum at the Museum. For complete information, please click here.
The Hall Curatorial Fellowship is a biennial program intended to offer an exceptional opportunity to an international curator to gain curatorial experience in a United States museum setting, and to support the professional development of curators. In order to bring an international perspective to the Museum's curatorial practice, the Hall Fellow will be primarily responsible for curating an original exhibition in keeping with the Museum's mission, overseeing its installation at The Aldrich, and the development of appropriate complementary cultural and educational programs. Click here to download the official guidelines and application.
Read more about the Hall Fellowship, including selection criteria, eligibility, adjudication, and terms.